PELLICLE — Lithography Line Control

PELLICLE — the line-control display of the Ardra Works, the only place left that can pattern a chip. The scanner's ultraviolet light path in cutaway, reticle 9's torn pellicle and a 1,148-die wafer, with the breach printing its shadow on every shot, and three pellicles left for seventeen layers. A cinematic FUI scene from SCENESCAPES Channel 71.

◀ SCENESCAPES / 71 / PELLICLE
ARDRA WORKS·LINE 5·BAY C·TESSIER, O.·LOT 2,384·WAFER 19/25·FIELD 66/96·YIELD 96.9 %·RETICLE 9 NOT PULLED·M1 · SCANNER 2C
SHOT 86,761LINE TIME ×1208:14:07
Pellicle · loupeR9 · ×19,000AFTER W18
Overlay ×10,000PER FIELD · 96 FIELDSW18
Layers
LOT YIELD · W1–W18
96.93%
▼ 1.27 VS 30-D 98.20 %
Reticle 9M1 · 4× · 152 MM PLATE · STAND-OFF 6.3 MMMONITOR 0/31
RETICLE 9 · HELDT−11:16
NOT PULLED
DECISION AT W25 · 6 WAFERS · REPELLICLE 13 DAYS
BREACH3.10 µM+0.4 NM/SHOT
OPENEDSHOT 78,94686,761
INSPECTEDAFTER W18 · 08:12:48+38.4 NM
R14 C9FAIL ×6 · SINCE W13C2 R1
PELLICLES3 LEFT · 17 LAYERS
IF PULLEDLINE 5 STOPS 13 DAYS2,385 WAITS
Overlay SPC|M|+3σ µM · PER WAFER · UCL 2.80 · CL 2.10LINE TIME ×12
SourcePULSE mJLINE TIME ×12
StageX/Y MMLINE TIME ×12
Lot queueLINE 5 · BAY C · 4 LOTSETA 08:25
Tool stateSCANNER 2CRUN
Defect ParetoADC · LOT 2,384 · W1–W17593
Line logNEWEST FIRST · LINE 5 · BAY C#0412